Equipamiento
Laser Shock Processing Lab
Spectra Physics Quanta Ray Pro 350
High energy Nd:YAG
10 Hz
2.5 J per pulse at 1064 nm
1.1 J per pulse at 532 nm
0.6 J per pulse at 355 nm
Industrial robot ABB
Water confinement jet
Laser Microfabrication Lab
UV ns Micromachining laser station ML-100
Spectra Physics HIPPO DPSS Nd:YVO4 355 nm
Pulse-width ~15 ns
15-300 kHz
5 W @ 50 kHz
Fix lens head, processing gas avaliable
Excimer ATL Laser Lasertechnik SP300i KrF excimer 248 nm
Pulse-width ~7 ns
300 Hz
5W @ 300 Hz
Mask projection
XYZ, rotation and tilt stages
Vision system TTL.
UV ns/ps (quasi-CW) Micromachining laser station AB200
Spectra Physics Pulseo DPSS Nd:YVO4
1Hz-400 kHz
20 W @100 kHz
pulse-width <20 ns
Spectra Physics Vanguard DPSS Nd:YVO4
80 MHz
Power 2.5 W
pulse-width <10 ps
Positioning system with 6 DOF
Vision system TTL
Fix lens head
Scanner head
XYZ linear stages rotation and tilt stages
ps Laser Lab
INNOLAS / Lumera Superapid. DPSS Nd:YVO4 1064 nm / 532 nm /355 nm
Pulse-width ~8 ps
18W @1064 nm
8W @ 532 nm
4W @ 355 nm
Fixed lens head with processing gas
Scanner Head (all wavelenghts)
XYZ stage (430x555x127mm)
Vision system for sample alignment.
Laser Surface Treatments & Welding Lab
Rofin-Sinar 3 CW Nd:YAG 3300 W
Industrial robot ABB IRB 4400
Optical fiber and cutting and welding processing heads
Hybrid welding head
Powder feder and Laser Cladding Head
Remote Welding Lab
Rofin-RWS CW CO2 3000W Scanner High length focal
Working area 1500 mm x 1500 mm
Laser heat treatment processes Lab
Rofin Dilas DL027S 808 & 940 nm CW laser 2700W
Fiber coupled
Cilindrical focusing lens
DirectPhotonics DirectBond 800 808nm CW laser. 60W
Fiber coupled
XY Cartesian industrial positioning system
Heating table (up to 750 °)
Laser Marking Lab
Trumpf Vectormark Compact Nd:YAG
Scanner
Rotatory axis
Raycus RLF-P20QE Pulsed Yterbium Fiber Laser
Wavelength 1060~1085 nm
Pulse duration < 120 ns
20W
30-60 kHz
Appolo Hub Lab
Two test benches for laser systems manufactured by Mondragón Assembly for the UPM Laser Center within the FP7 Appolo project. These benches allow mounting all types of vision and control positioning systems for laser processes.
Bench 1:
EKSPLA Atlantic laser in ps (60 W) with IR, VIS and UV emission
Optical system with scanners or fixed lens for the three laser wavelengths
Bench 2: LIFT processes and curing of metallic pastes
Spectra Physics Explorer DPSS Nd:YVO4 532 nm
2 W @ 50 kHz
Pulse duration: 15 ns
Pulse frequency: 20-150 kHz
Energy attenuator
Beam shaper (piShaper) for 532 nm
Spectra Physics Millennia DPSS Nd:YVO4 532 nm CW - 5 W
Spectra Physics Navigator X15SC
1064 nm
7W@20kHz
Pulse duration: 20ns
Pulse frequency: 15-100kHz
XYZ stages
Scanner
Distance control between donor and acceptor substrate for the LIFT process.
LIFT process parameterization Lab
Spectra Physics HIPPO. DPSS Nd:YVO4
355 nm
Pulse-width ~15 ns
15-300 kHz
5 W @ 50 kHz
532 nm
Pulse-width ~15 ns
15-300 kHz
11W @ 50 kHz
Fix optics / Scanner
High speed, high resolution imaging platform (25 ns resolution) for LIFT transfer imaging.
Laser Bioprinting Lab
BA-LIFT machine Innofluence Start-up
5-axis system for independent positioning of donor (3 axis, 2 for positioning and 1 for focusing) and acceptor (2 axis)
Automatic attenuator (software controlled)
Two cameras (fluorescence detector and conventional image)
Software for cell detection and single cell transference
Crylas FTSS355-Q4 Nd:YAG
355 nm
Pulse Width < 1.3 ns
1 - 1000 Hz
42 mW @ 1 kHz
Biological safety cabinet Nuaire NU543600E
Centrifuge Thermo Scientific Sorvall ST8
Incubator Thermo Scientific MIDI 40
Hot Water Bath Fishherbrand FSGPD05
Mechanical Characterization Lab
Tribometer pin on disk Microtest
Hole-drilling residual stress testing equipment
Fatigue Testing Machine MTS 810
Corrosion test equipment
Microscopy Lab
Scanning electron microspe Hitachi 3000N SEM + EDX microanalysis
Magnification x15-300K
EDX: working distance 15 mm.
X-ray take-off angel (TOA) 35°
Interferometric and confocal microscope Leica DCM 3D
Objectives from 5× up to 100× in confocal
PV Characterization Lab
Electrical Characterization System
Arc Xe Lamp Housings 300 watt.
Keithley Model 2400 sourceMeter
Dark box for dark Current-Voltage measurements.
Raman Microscope Renishaw inVia
Ar ion laser (514.5nm)
5X, 20X, 50X, 100X objectives.
Motorized XYZ Stage
Digital camera.
LIFT processes Characterization Lab
Ink/Paste deposit
Control Coater model 101 RK PrintCoat Instruments Ltd
Spin Coater model WS-650 Laurent Technologies
Viscosity measurement
Viscometer Brookfield DV2T for low to medium viscosities
Viscometer Cone & Plate (Wells/Brookfiel HBDV-II Cone spindle CPE-52) for High viscosity pastes
System for Surface Tension measurement using the pendant drop method
Thickness measurement
Optical Contact for fluid thickness measurement
Precitec Interferometric System for Fluid thickness meassurement
Simulation and Modelling Lab
COMSOL 5.5
Matlab
Abaqus
Workstations for simulations